Solid-state seeded nano-second pulse CO2 oscillator for extreme ultraviolet lithography
نویسندگان
چکیده
منابع مشابه
Interaction of a CO2 Laser Pulse With Tin-Based Plasma for an Extreme Ultraviolet Lithography Source
The interaction of a CO2 laser pulse with Sn-based plasma for a 13.5-nm extreme ultraviolet (EUV) lithography source was investigated. It was noted that a CO2 laser with wavelength of 10.6 μm is more sensitive to surface impurities as compared with a Nd:YAG laser with wavelength of 1.06 μm. This reveals that a CO2 laser is more likely absorbed in a thinner layer near the target surface. Compare...
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ژورنال
عنوان ژورنال: Photonics Letters of Poland
سال: 2013
ISSN: 2080-2242
DOI: 10.4302/plp.2013.3.06